The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 27, 1999

Filed:

Apr. 07, 1998
Applicant:
Inventors:

Yuusuke Sato, Tokyo-To, JP;

Toshimitsu Ohmine, Tokyo-To, JP;

Takaaki Honda, Mishima, JP;

Assignees:

Kabushiki Kaisha Toshiba, Kanagawa-Ken, JP;

Toshiba Kikai Kabushiki Kaisha, Tokyo-To, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
427-8 ; 427 10 ; 4272481 ; 438-5 ; 438-7 ;
Abstract

A substrate such as a semiconductor wafer is transferred to a plurality of process chambers so as to perform prescribed processes. An inspection chamber is air-tightly connected to each of the process chambers. The inspection chamber is provided with a handler which loads and unloads the substrate. A gate valve is disposed between each process chamber and the inspection chamber. By this gate valve, each chamber is air-tightly closed.

Published as:
GB9306341D0; GB2265634A; GB2265634B; US5766360A; US5897710A;

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