Toshihiro Tsuruta

Title: Innovations by Toshihiro Tsuruta in Gas Flow Rate Measurement

Introduction

Toshihiro Tsuruta, an accomplished inventor based in Miyagi, Japan, has made significant contributions to the field of substrate processing through his innovative approach to determining gas output flow rates. With a patent to his name, Tsuruta exemplifies the ingenuity found in research institutions and technology companies.

Latest Patents

Tsuruta holds a patent for a "Method of determining output flow rate of gas output by flow rate controller of substrate processing apparatus." This innovative method utilizes a selection process between two pressure sensors based on a set flow rate to enhance the accuracy of gas measurement in a chamber. The system focuses on measuring the pressure within the chamber until it reaches a predetermined target pressure, thus allowing precise control of gas output.

Career Highlights

Currently, Toshihiro Tsuruta is associated with Tokyo Electron Limited, a leading company in the field of semiconductor and electronics manufacturing equipment. His role in driving innovation at the company showcases his commitment to advancing technology in substrate processing applications. With only one patent to date, his contributions are vital to his company’s vision for improving equipment functionality and reliability.

Collaborations

Throughout his career, Tsuruta has worked alongside prominent colleagues including Jun Yamashima and Shinichiro Hayasaka. Their collaboration has fostered an environment of creativity and invention, pushing the boundaries of what's possible in their field.

Conclusion

Toshihiro Tsuruta is a noteworthy figure in the realm of innovation and technology within Japan. His patent highlights his dedication to enhancing processes that are crucial for modern semiconductor manufacturing. With continued collaboration and study, Tsuruta and his peers are likely to drive further innovations that will impact the industry for years to come.