Company Filing History:
Years Active: 1990-1996
Title: The Innovations of Toshihiko Shimada
Introduction
Toshihiko Shimada is a notable inventor based in Nagano, Japan. He has made significant contributions to the field of semiconductor technology and metal treatment processes. With a total of 3 patents to his name, Shimada's work has had a considerable impact on the industry.
Latest Patents
One of his latest patents is titled "Metal insert and rough-surface treatment method thereof." This invention involves a metal insert that is at least partially embedded in a molded resin mass. The insert comprises a metal insert blank and a substantial amount of nickel or nickel alloy granulations produced over its surface. The granulations are controlled to be at most 1.0 µm in size. The process includes a first electrolytic plating process to spread copper nuclei over the surface, followed by a second electrolytic plating process to grow these nuclei into nickel or nickel alloy granulations.
Another significant patent is related to "Tape automated bonding in semiconductor technique." This invention describes a tape useful for automatic bonding processes in the manufacturing of high-frequency semiconductor devices. The tape consists of an insulating flexible film with circuit patterns made of copper or copper alloy. It features a tin or tin-lead plated film on the pattern, along with an intermediate plated film on the outer lead portion, which consists of a selected metal or metal alloy.
Career Highlights
Toshihiko Shimada is currently employed at Shinko Electric Industries Co., Ltd. His work at this company has allowed him to develop innovative solutions that enhance semiconductor manufacturing processes. His expertise in metal treatment and bonding techniques has positioned him as a valuable asset in the field.
Collaborations
Shimada has collaborated with notable coworkers, including Akihiko Murata and Kazuhito Yumoto. Their combined efforts have contributed to advancements in semiconductor technology and related fields.
Conclusion
Toshihiko Shimada's contributions to innovation in semiconductor technology and metal treatment processes are noteworthy. His patents reflect a commitment to advancing industry standards and improving manufacturing techniques. His work continues to influence the field positively.
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