Location History:
- Shinjuku-ku, JP (2015 - 2018)
- Tokyo, JP (2016 - 2020)
Company Filing History:
Years Active: 2015-2020
Title: Innovations of Toshihiko Orihara: A Pioneer in Lithography
Introduction
Toshihiko Orihara is a renowned inventor based in Tokyo, Japan, celebrated for his pioneering contributions to lithography technology. With an impressive portfolio featuring 16 patents, Orihara's innovative solutions have significantly impacted semiconductor manufacturing processes.
Latest Patents
Orihara's most recent patents showcase his expertise in producing high-quality mask blank substrates essential for advanced lithography applications. These include:
1. Mask blank substrate
2. Substrate with multilayer reflection film
3. Transmissive mask blank
4. Reflective mask blank
5. Transmissive mask
6. Reflective mask
7. Semiconductor device fabrication method
His inventions focus on optimizing the mask blank substrate, ensuring high-level smoothness and low-defect quality through meticulous measurements and innovative processing methods.
Career Highlights
Currently affiliated with Hoya Corporation, Orihara has devoted his career to refining lithography technologies. His groundbreaking work in mask blank substrate development emphasizes the importance of precise relationships between bearing areas and depths, driving improvements in manufacturing efficiency and quality in the semiconductor industry.
Collaborations
Throughout his career, Orihara has worked alongside notable colleagues such as Tsutomu Shoki and Kazuhiro Hamamoto. Together, they have collaborated on various projects that advance knowledge and technology in the realm of lithography and semiconductor fabrication.
Conclusion
Toshihiko Orihara stands as a remarkable figure in the field of modern invention, with a legacy built on innovation and collaboration. His continued contributions via Hoya Corporation underline his commitment to enhancing technologies that shape the future of semiconductor manufacturing.