Mask blank substrate processing device, mask blank substrate processing method, mask blank substrate fabrication method, mask blank fabrication method, and transfer mask fabrication method

Abstract

Provided are a mask blank substrate processing device, a mask blank substrate processing method, a mask blank substrate fabrication method, a mask blank fabrication method, and a transfer mask fabrication method, for surface processing a mask blank substrate such that a high-level smoothness and a low-defect quality are satisfied. A mask blank substrate processing device () comprises: substrate support means () for supporting a substrate (Y); a catalytic surface plate () comprising a catalytic face () which is positioned opposite the principal surface of the substrate (Y); relative movement means () for causing the catalytic face () and the principal surface to move relative to each other in a state of being either in contact or in close proximity; first processing fluid supply means () which supplies a first processing fluid for CARE to the principal surface; and physical cleaning means () for removing foreign matter which has adhered to the principal surface from the principal surface, using a physical action.