Toshihiko Iwao

Title: **Innovations by Toshihiko Iwao: Pioneering Advances in Plasma Processing**

Introduction

Toshihiko Iwao, a prominent inventor based in Miyagi, Japan, holds an impressive portfolio of 20 patents. His contributions to the field of plasma processing technology demonstrate a commitment to advancing methods and apparatuses that enhance the efficiency and effectiveness of manufacturing processes.

Latest Patents

Among his noteworthy innovations are two patents focusing on plasma processing. The first is a **Plasma Processing Apparatus and Plasma Processing Method**. This invention involves a sophisticated apparatus designed for processing workpieces using plasma. It features a stage for placing the workpiece, a waveguide that introduces plasma-generating electromagnetic waves in the VHF band, and a specially designed dielectric window that transmits these waves to the processing space. The dielectric window, characterized by its annular shape and multiple convex portions, effectively enhances the plasma processing environment.

The second patent is related to **Hard Mask Deposition Using Direct Current Superimposed Radio Frequency Plasma**. This method innovatively forms a carbon hard mask by generating a radio frequency plasma containing carbon-based ions. It allows for the adjustment of ion energy through the simultaneous application of direct current power, ensuring optimal deposition on substrates within the plasma processing chamber.

Career Highlights

Toshihiko Iwao is associated with Tokyo Electron Limited, a leading company in the semiconductor and electronic device manufacturing sector. His work there has significantly contributed to the company's advancements in plasma processing technologies, establishing him as a key figure in the industry.

Collaborations

Throughout his career, Iwao has collaborated with several accomplished colleagues, including Jianping Zhao and Takahiro Hirano. These partnerships have facilitated the exchange of ideas and technical insights, leading to innovative solutions in plasma processing applications.

Conclusion

Toshihiko Iwao's extensive patent portfolio and significant contributions to plasma processing illustrate his role as an innovator in the field. His work at Tokyo Electron Limited and collaborations with various experts reinforce his impact on the industry, paving the way for future advancements in manufacturing technologies.