The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2018
Filed:
Mar. 11, 2014
Tokyo Electron Limited, Tokyo, JP;
Merritt Funk, Austin, TX (US);
Jianping Zhao, Austin, TX (US);
Lee Chen, Cedar Creek, TX (US);
Toshihiko Iwao, Sendai Miyagi, JP;
Toshihisa Nozawa, Sendai Miyagi, JP;
Zhiying Chen, Austin, TX (US);
Peter Ventzek, Austin, TX (US);
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A processing system is disclosed, having a power transmission element with an interior cavity that propagates electromagnetic energy proximate to a continuous slit in the interior cavity. The continuous slit forms an opening between the interior cavity and a substrate processing chamber. The electromagnetic energy may generate an alternating charge in the continuous slit that enables the generation of an electric field that may propagate into the processing chamber. The electric field may interact with process gas in the processing chamber to generate plasma for treating the substrate. The interior cavity may be isolated from the process chamber by a dielectric component that covers the continuous slit. The power transmission element may be used to control plasma density within the process chamber, either by itself or in combination with other plasma sources.