The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2021
Filed:
May. 26, 2020
Tokyo Electron Limited, Tokyo, JP;
Toshihiko Iwao, Austin, TX (US);
Takaaki Kato, Yamanashi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A plasma processing apparatus is provided, in which an electromagnetic wave in a VHF band of 100 MHz or higher is supplied to a chamber to form a plasma. The plasma processing apparatus includes a ceiling wall that defines a part of the chamber, and a central conductor for supplying the electromagnetic wave that is disposed in a hole formed in the center of the ceiling wall. A central position of the central conductor substantially coincides with a central position of a stage on which a workpiece is placed, and an outer diameter of the central conductor and a size of the hole of the ceiling wall are defined such that a cutoff frequency of a coaxial path composed of the central conductor and the ceiling wall is greater than a frequency of the electromagnetic wave.