Toshiharu Kinoshita

Title: Innovations of Toshiharu Kinoshita

Introduction

Toshiharu Kinoshita is a notable inventor based in Kakamigahara, Japan. He has made significant contributions to the field of heat storage technology, holding a total of 5 patents. His work focuses on innovative materials and methods for efficient heat storage and radiation.

Latest Patents

One of his latest patents is a heat storage member that includes a substrate made from a SiC sintered body as a principal ingredient. This member is designed to store and radiate heat through a reversible chemical reaction with a reaction medium or by physical adsorption and desorption. The substrate features a three-dimensional network structure with a porosity of 1% or less, and the void ratio within this structure ranges from 30 to 95%. The heat storage material is strategically placed on the surface of the voids in the substrate's network structure. Another patent involves a similar heat storage member that includes a coating layer on the substrate, with a softening point of 1000°C or less. This design also allows for heat storage through reversible chemical reactions and physical adsorption.

Career Highlights

Toshiharu Kinoshita has worked with prominent companies such as NGK Insulators, Inc. and NGK Adrec Co., Ltd. His experience in these organizations has contributed to his expertise in materials science and engineering.

Collaborations

Throughout his career, Kinoshita has collaborated with notable colleagues, including Tsuneo Komiyama and Shinichi Miwa. These partnerships have likely enhanced his innovative capabilities and broadened his research horizons.

Conclusion

Toshiharu Kinoshita's contributions to heat storage technology through his patents and collaborations highlight his role as a significant inventor in this field. His innovative approaches continue to influence advancements in materials science.