Location History:
- Dresden, DE (2004 - 2010)
- Nirasaki, JP (2012)
- Miyagi, JP (2015)
- Hsin-chu, TW (2020 - 2023)
Company Filing History:
Years Active: 2004-2023
Title: The Innovations of Toshifumi Nagaiwa: A Pioneer in Plasma Processing Technology
Introduction
Toshifumi Nagaiwa is a distinguished inventor based in Hsin-Chu, Taiwan, recognized for his contributions to the field of plasma processing technology. With a substantial portfolio of 10 patents, Nagaiwa has made significant strides in the development of methods and apparatuses that enhance the efficiency of target object processing.
Latest Patents
His recent innovations include two notable patents: the "Target Object Processing Method" and the "Plasma Processing Method." The target object processing method involves a sophisticated plasma processing apparatus that features a processing chamber, a mounting table for the target object, and an outer peripheral member. This method focuses on efficiently processing masks positioned on etching target films through precise voltage applications and gas supply, ensuring that the processing is both accurate and effective.
In addition, the plasma processing method he developed positions the upper surface of a focus ring strategically in relation to a substrate. This unique design allows for effective plasma generation and processing while maintaining critical height dimensions, thus enhancing the overall performance of plasma treatment in industrial applications.
Career Highlights
Nagaiwa's work at Tokyo Electron Limited has been pivotal in advancing plasma processing technologies, making them more precise and reliable for various applications. His inventions are not only a testament to his expertise but also reflect his commitment to innovation in the semiconductor industry.
Collaborations
Throughout his career, Toshifumi Nagaiwa has had the privilege of collaborating with talented colleagues, including Shuei Sekizawa and Kosuke Imafuku. Their combined efforts in research and technology have contributed significantly to the enhancements in plasma processing methods and systems.
Conclusion
In summary, Toshifumi Nagaiwa stands out as an influential inventor whose work in plasma processing has impacted the semiconductor sector significantly. With his ongoing innovations and collaborative spirit, Nagaiwa continues to push the boundaries of technology, paving the way for future advancements in the industry.