The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2022
Filed:
Jun. 03, 2019
Tokyo Electron Limited, Tokyo, JP;
Toshifumi Nagaiwa, Hsin-chu, TW;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A plasma processing apparatus includes a chamber, a substrate support, a radio-frequency power supply, and a controller. The substrate support includes a lower electrode and is disposed in the chamber to mount a focus ring to surround a disposed substrate on the substrate support. The radio-frequency power supply supplies a bias radio-frequency power to the lower electrode. The controller causes specifying a power level of the bias radio-frequency power corresponding to a specified value of the DC potential of the focus ring by using a table or a function that defines a relationship between the power level of the bias radio-frequency power and the DC potential of the focus ring generated by supplying the bias radio-frequency power to the lower electrode, and controlling the radio-frequency power supply to supply the bias radio-frequency power having the specified power level to the lower electrode during a plasma generation in the chamber.