Aichi, Japan

Toru Kamada

This inventor holds 2 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignee: Fujimi Incorporated. Active years: 2021-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toru Kamada. Retrieved from https://idiyas.com/inventor/toru-kamada-gm78cw10

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0


Average Co-Inventor Count = 4.8

ph-index = 1


Company Filing History:


Years Active: 2021-2022

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2 patents (USPTO):Explore Patents

Title: Toru Kamada: Inventor in Polishing Technology

Introduction

Toru Kamada is an inventor based in Aichi, Japan, whose patent work focuses on polishing methods and materials. He works at Fujimi Incorporated and is associated with 2 patents.

Latest Patents

Kamada’s listed patents address polishing pads, abrasives, and polishing compositions.

“Polishing Method and Polishing Pad” describes a disc-shaped pad with a tapered peripheral surface and specified geometry and hardness. In the method, slurry containing abrasives is supplied to a surface larger than the pad’s polishing surface, which is pressed against and moved across the workpiece.

“Abrasive, Polishing Composition, and Polishing Method” presents an alumina abrasive with a specified α-conversion rate and particle-size range. The related polishing composition has a pH of 7 or less and is intended to polish alloys or metal oxides at a sufficient removal rate while producing a high-quality mirror finish.

Career Highlights

Kamada’s patent portfolio reflects work on polishing processes and consumables, including pad design and abrasive composition. These technologies are directed toward controlling material removal and surface finish.

Collaborations

Kamada’s listed coworkers include Hitoshi Morinaga and Yuuichi Ito. His work is associated with Fujimi Incorporated.

Conclusion

Toru Kamada’s inventions focus on polishing pads and alumina-based abrasives, with the goal of improving polishing performance and the quality of finished surfaces.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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