Fujimi Incorporated

Toru Kamada

Hitoshi Morinaga

Kazusei Tamai

Maiko Asai

Yuuichi Ito

Kyosuke Tenko

Koji Katayama

Takashi Horibe

A disc-shaped polishing pad () is used for a polishing method of the present invention. The polishing pad () has a peripheral surface () on a polishing surface () side in an axial direction of the disc of a tapered surface whose diameter is reduced to the polishing surface (). An angle formed by the peripheral surface () and the polishing surface () is 125&#xb0; or more and less than 180&#xb0;. The polishing pad () has a hardness immediately after a pressing surface is in close contact of 40 or more by a testing method specified in an appendix 2 of JIS K7312: 1996, 'Spring Hardness Test Type C Testing Method'. A slurry containing abrasives is supplied to a polished surface larger than the polishing surface (). The polishing surface () is pressed against the polished surface and the polishing pad () is moved to polish the polished surface.

Polishing method and polishing pad

Provided are an abrasive, a polishing composition, and a polishing method capable of polishing the surface of an alloy or metal oxide at a sufficient polishing removal rate and providing a high-quality mirror surface. The abrasive contains alumina having an &#x3b1;-conversion rate of 80% or more and having a 50% particle diameter, in a volume-based cumulative particle diameter distribution, of 0.15 &#x3bc;m or more to 0.35 &#x3bc;m or less. The polishing composition contains this abrasive and has a pH of 7 or less. These abrasive and polishing composition are used for polishing polishing objects containing at least one of an alloy and a metal oxide.

Abrasive, polishing composition, and polishing method

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Aichi, Japan

Toru Kamada