Toru Ito

Title: Toru Ito: Innovator in Plasma Processing Technology

Introduction

Toru Ito is a prominent inventor based in Tokyo, Japan, known for his significant contributions to plasma processing technology. With a total of nine patents to his name, he has made remarkable advancements in methods that enhance the efficiency and precision of plasma etching processes.

Latest Patents

Among his latest innovations is a plasma processing method designed to uniformly remove a processing target film in a lateral direction, even when the depth of a trench is increased. This method is particularly effective for plasma-etching tungsten films in stacked configurations of insulating films and tungsten films. The process involves a series of depositing and etching steps that are repeated a predetermined number of times to achieve optimal results. Another notable patent is a plasma processing method that selectively removes amorphous carbon films after plasma etching, utilizing a mask containing boron. This method employs a mixed gas of oxygen and CHF gas to effectively remove the unwanted film.

Career Highlights

Toru Ito has worked with esteemed companies such as Shiseido Company, Limited and Mitsubishi Electric Corporation. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technologies in the field of plasma processing.

Collaborations

Throughout his career, Toru has collaborated with notable colleagues, including Takanori Sato and Yasukazu Nakamura. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Toru Ito's work in plasma processing technology exemplifies the impact of innovative thinking in the field of engineering. His patents reflect a commitment to advancing manufacturing processes and improving the efficiency of material processing.