Toru Ito

Title: Toru Ito: Innovator in Plasma Processing Technology

Introduction

Toru Ito is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 5 patents. His work has been instrumental in advancing the capabilities of plasma processing apparatuses.

Latest Patents

One of his latest patents is a plasma processing apparatus that includes a processing chamber, a first electrode, and a second electrode disposed to face each other. This apparatus features a high-frequency power supply unit that applies high-frequency power to either electrode. Additionally, it has a processing gas supply unit for delivering a processing gas to the processing space. A main dielectric member is provided at a substrate mounting portion on the main surface of the first electrode. A focus ring is attached to the first electrode to cover the peripheral portion of its main surface. Furthermore, a peripheral dielectric member is included in the peripheral portion on the main surface of the first electrode, ensuring that the electrostatic capacitance per unit area applied between the first electrode and the focus ring is smaller than that applied between the first electrode and the substrate by the main dielectric member.

Career Highlights

Toru Ito has worked with prominent companies in the industry, including Tokyo Electron Limited. His experience in these organizations has allowed him to refine his skills and contribute to innovative technologies in plasma processing.

Collaborations

Throughout his career, Toru has collaborated with notable individuals such as Satoshi Tanaka and Chishio Koshimizu. These collaborations have further enriched his work and led to advancements in the field.

Conclusion

Toru Ito's contributions to plasma processing technology and his innovative patents highlight his role as a significant inventor in this field. His work continues to influence advancements in technology and industry practices.