Location History:
- Chuo-ku, JP (2009)
- Tokyo, JP (1991 - 2017)
Company Filing History:
8 out of 1,058 
1 out of 58,130 
1 out of 35,705 
Years Active: 1991-2017
Title: Tooru Kimura: Innovator in Film Formation Technologies
Introduction
Tooru Kimura is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of film formation technologies, holding a total of 10 patents. His work has been instrumental in advancing methods and compositions used in various applications.
Latest Patents
Kimura's latest patents include a composition for film formation, resist underlayer film, and a pattern-forming method. The composition for film formation features a compound represented by a specific formula and a solvent. This innovative approach allows for enhanced film formation processes. Additionally, his composition for forming a resist underlayer film includes a polysiloxane and a solvent composition, which is crucial for achieving high-quality results in film applications.
Career Highlights
Throughout his career, Tooru Kimura has worked with notable companies such as JSR Corporation and Sony Corporation. His experience in these leading organizations has allowed him to refine his expertise and contribute to groundbreaking advancements in technology.
Collaborations
Some of his notable coworkers include Shin-ichiro Iwanaga and Fumihiro Toyokawa. Their collaborative efforts have further enriched the innovative environment in which Kimura operates.
Conclusion
Tooru Kimura's contributions to film formation technologies and his impressive portfolio of patents highlight his role as a key innovator in the field. His work continues to influence advancements in technology and applications across various industries.