The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2006
Filed:
Dec. 13, 2002
Applicants:
Shin-ichiro Iwanaga, Tokyo, JP;
Satoshi Iwamoto, Tokyo, JP;
Tooru Kimura, Tokyo, JP;
Hiroko Nishimura, Tokyo, JP;
Koji Nishikawa, Tokyo, JP;
Inventors:
Shin-ichiro Iwanaga, Tokyo, JP;
Satoshi Iwamoto, Tokyo, JP;
Tooru Kimura, Tokyo, JP;
Hiroko Nishimura, Tokyo, JP;
Koji Nishikawa, Tokyo, JP;
Assignee:
JSR Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
Abstract
A radiation-sensitive resin composition comprising (A) an alkali-soluble resin having an unsaturated group, (B) a compound having at least one ethylenically unsaturated double bond, and (C) a radiation-induced radical polymerization initiator, wherein: The resin composition can form a radiation-sensitive film in a thickness greater than a deposit thickness and has a high resolution.