Mountain View, CA, United States of America

Tony Jefferson Gnanaprakasa

USPTO Granted Patents = 1 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):

Title: The Innovative Contributions of Tony Jefferson Gnanaprakasa

Introduction

Tony Jefferson Gnanaprakasa is a notable inventor based in Mountain View, CA (US). He has made significant contributions to the field of thermometry, particularly in plasma environments. His innovative approach has led to advancements in temperature measurement techniques that are crucial for various industrial applications.

Latest Patents

Tony holds a patent for "Etalon thermometry for plasma environments." This patent describes a method and apparatus for determining the temperature of a substrate within a processing chamber. The technology utilizes an etalon assembly and a heterodyning effect to ascertain the first temperature of a substrate without physical contact. Additionally, a separate temperature sensor measures a second temperature of the substrate or the substrate support at a similar location. The data from both temperature measurements can be used to calibrate temperature sensors or adjust process parameters within the processing chamber.

Career Highlights

Tony is currently employed at Applied Materials, Inc., where he continues to develop innovative solutions in the field of materials engineering. His work has been instrumental in enhancing the efficiency and accuracy of temperature measurement in various processing environments.

Collaborations

Throughout his career, Tony has collaborated with esteemed colleagues, including Bruce E Adams and Samuel C Howells. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Tony Jefferson Gnanaprakasa's contributions to thermometry and plasma environments exemplify the spirit of innovation. His patent and ongoing work at Applied Materials, Inc. highlight the importance of precise temperature measurement in advancing industrial processes.

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