Applied Materials, Inc.

Tony Jefferson Gnanaprakasa

Bruce E Adams

Samuel C Howells

Lei Lian

Barry Craver

Alvaro Garcia

A method and apparatus for determining the temperature of a substrate within a processing chamber are described herein. The methods and apparatus described herein utilize an etalon assembly and a heterodyning effect to determine a first temperature of a substrate. The first temperature of the substrate is determined without physically contacting the substrate. A separate temperature sensor also measures a second temperature of the substrate and/or the substrate support at a similar location. The first temperature and the second temperature are utilized to calibrate one of the temperature sensors disposed within the substrate support, a model of the processes performed within the processing chamber, or to adjust a process parameter of the process performed within the processing chamber.

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Mountain View, CA, United States of America

Tony Jefferson Gnanaprakasa