Miyagi, Japan

Tomoyuki Oishi


 

Average Co-Inventor Count = 3.5

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2017-2025

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7 patents (USPTO):

Title: The Innovative Contributions of Tomoyuki Oishi

Introduction

Tomoyuki Oishi is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of semiconductor processing, holding a total of seven patents. His work focuses on advanced methods for etching polycrystalline semiconductors, which are crucial for the development of modern electronic devices.

Latest Patents

One of Oishi's latest patents is titled "Etching of Polycrystalline Semiconductors." This patent describes a method of processing a substrate that involves performing a cyclic plasma etch process. The process includes multiple cycles, where a patterning layer made of polycrystalline semiconductor material is etched to form or extend a recess. This is achieved by exposing the substrate to different plasmas, including a first plasma, a second plasma containing dihydrogen, and a third plasma, each serving a unique purpose in the etching process. Another notable patent is the "Method for Processing Workpiece," which outlines a procedure for etching an antireflection film using a mask and plasma generated in a processing container. This method emphasizes the importance of conformally forming a protective film on the mask's surface to enhance the etching accuracy.

Career Highlights

Tomoyuki Oishi is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing industry. His role involves developing innovative techniques that improve the efficiency and effectiveness of semiconductor processing. Oishi's expertise in plasma etching has positioned him as a key figure in advancing semiconductor technology.

Collaborations

Oishi has collaborated with notable coworkers, including Yoshihide Kihara and Toru Hisamatsu. Their combined efforts contribute to the ongoing research and development in the field of semiconductor processing.

Conclusion

Tomoyuki Oishi's innovative work in semiconductor processing has led to significant advancements in the industry. His patents reflect a deep understanding of plasma etching techniques, which are essential for the production of high-performance electronic devices. Oishi's contributions continue to shape the future of semiconductor technology.

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