Tomoyoshi Ichimaru

Title: Tomoyoshi Ichimaru: Innovator in Plasma Processing Technologies

Introduction

Tomoyoshi Ichimaru is a notable inventor based in Kudamatsu, Japan. He has made significant contributions to the field of semiconductor processing, particularly in dry etching methods. With a total of 3 patents to his name, Ichimaru continues to push the boundaries of innovation in his industry.

Latest Patents

Ichimaru's latest patents include a plasma processing method that provides a dry etching technique capable of creating rounded top edge portions, known as top rounds, at trenches and vias formed by the removal of a dummy material. This method involves etching the dummy material to a predetermined depth, performing isotropic etching, and subsequently removing the remaining part of the dummy material. Another significant patent is a dry etching method designed for wiring processes on semiconductor substrates using a plasma etching apparatus. This invention ensures that the wiring process is executed without causing disconnection or deflection, utilizing a mixed gas of halogen-based and fluorine-containing gases to achieve uniform processing.

Career Highlights

Ichimaru is currently associated with Hitachi High-Technologies Corporation, where he applies his expertise in semiconductor technologies. His work has been instrumental in advancing the efficiency and effectiveness of plasma etching processes.

Collaborations

Ichimaru has collaborated with notable colleagues such as Kenichi Kuwabara and Go Saito, contributing to various projects that enhance semiconductor manufacturing techniques.

Conclusion

Tomoyoshi Ichimaru's innovative work in plasma processing methods has established him as a key figure in the semiconductor industry. His patents reflect a commitment to improving technology and efficiency in semiconductor manufacturing.