The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2011
Filed:
Jul. 30, 2009
Takeshi Shima, Kudamatsu, JP;
Kenichi Kuwabara, Hikari, JP;
Tomoyoshi Ichimaru, Kudamatsu, JP;
Kenji Imamoto, Hikari, JP;
Takeshi Shima, Kudamatsu, JP;
Kenichi Kuwabara, Hikari, JP;
Tomoyoshi Ichimaru, Kudamatsu, JP;
Kenji Imamoto, Hikari, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
After etching a polysilicon film, when a protective film made of a carbon polymer is formed on a sidewall of the polysilicon film using plasma containing carbons, a metallic material as a lower film is etched using plasma containing a halogen gas under an etching condition in which volatility is improved due to the rise in a wafer temperature or the low pressure of a processing pressure, thereby preventing a side etching and unevenness of a sidewall of the polysilicon film. Further, by using the protective film made of a carbon polymer, metallic substances scattered at the time of etching the metallic material are not directly attached to the polysilicon film, but can be simply removed along with the protective film made of a carbon polymer in an asking step.