Kenji Imamoto

Title: Kenji Imamoto: Innovator in Dry Etching Technology

Introduction

Kenji Imamoto is a notable inventor based in Hikari, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative dry etching method. His work has implications for improving the efficiency and quality of electronic components.

Latest Patents

Imamoto holds a patent for a dry etching method that enhances the etching process of polysilicon films. This method involves forming a protective film made of a carbon polymer on the sidewall of the polysilicon film using plasma containing carbons. The etching of a metallic material as a lower film is conducted using plasma with halogen gas, which improves volatility due to increased wafer temperature or reduced processing pressure. This technique effectively prevents side etching and unevenness of the polysilicon film's sidewall. Additionally, the protective film allows for the easy removal of metallic substances that may scatter during the etching process.

Career Highlights

Kenji Imamoto is associated with Hitachi High-Technologies Corporation, where he has been able to apply his expertise in semiconductor technology. His innovative approaches have contributed to advancements in the manufacturing processes used in the electronics industry.

Collaborations

Imamoto has worked alongside talented colleagues such as Takeshi Shima and Kenichi Kuwabara. Their collaborative efforts have furthered the development of cutting-edge technologies in their field.

Conclusion

Kenji Imamoto's contributions to dry etching technology exemplify the importance of innovation in the semiconductor industry. His patented methods not only enhance manufacturing processes but also pave the way for future advancements in electronic component production.