Takeshi Shima

Title: The Innovative Contributions of Takeshi Shima

Introduction

Takeshi Shima is a notable inventor based in Kudamatsu, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to dry etching methods. His work has implications for improving the manufacturing processes of electronic components.

Latest Patents

Takeshi Shima holds a patent for a dry etching method. This method involves etching a polysilicon film and forming a protective film made of a carbon polymer on the sidewall of the polysilicon film using plasma containing carbons. The process allows for the etching of a metallic material as a lower film using plasma containing a halogen gas. This technique enhances volatility due to increased wafer temperature or reduced processing pressure, effectively preventing side etching and unevenness of the polysilicon film's sidewall. Additionally, the protective film made of a carbon polymer ensures that metallic substances scattered during the etching process do not adhere directly to the polysilicon film, allowing for easier removal during the subsequent cleaning step.

Career Highlights

Takeshi Shima is associated with Hitachi High-Technologies Corporation, where he has been able to apply his innovative ideas in a practical setting. His work has contributed to advancements in semiconductor manufacturing, showcasing his expertise and commitment to innovation.

Collaborations

Throughout his career, Takeshi has collaborated with notable colleagues, including Kenichi Kuwabara and Tomoyoshi Ichimaru. These collaborations have fostered an environment of creativity and innovation, leading to significant advancements in their respective fields.

Conclusion

Takeshi Shima's contributions to the field of semiconductor technology through his innovative dry etching method highlight his role as a leading inventor. His work not only enhances manufacturing processes but also sets a foundation for future advancements in the industry.