Koshi, Japan

Tomoya Onitsuka

USPTO Granted Patents = 2 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2020-2025

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2 patents (USPTO):Explore Patents

Title: The Innovative Mind of Tomoya Onitsuka

Introduction

Tomoya Onitsuka, an innovative inventor based in Koshi, Japan, has made significant contributions to the field of thermal treatment technology. With a total of two patents to his name, Onitsuka's inventions exhibit a deep understanding of both thermal processing and substrate treatment, making him a noteworthy figure in his industry.

Latest Patents

Onitsuka's latest patents reflect his dedication to enhancing heat treatment processes. The first patent is a **Heat Treatment Apparatus and Heat Treatment Method**. This invention introduces a unique apparatus designed to treat substrates with exposed resist films. By enabling a lifting mechanism and employing specialized gas supply techniques, this device allows for a controlled heating process that optimizes the substrate's solubility characteristics.

His second patent focuses on a **Substrate Treatment Method and Thermal Treatment Apparatus**. This innovative system utilizes a treatment chamber to perform thermal treatments on metal-containing films. The inclusion of a moisture supply unit enables precise management of moisture levels during the treatment process, improving the quality and effectiveness of the thermal treatment.

Career Highlights

Tomoya Onitsuka is associated with Tokyo Electron Limited, a leading company in the semiconductor industry. His work and innovations have played a crucial role in advancing the company's thermal treatment technologies. Onitsuka's ability to merge theoretical knowledge with practical application has garnered respect from peers and industry leaders alike.

Collaborations

Within his career at Tokyo Electron Limited, Onitsuka collaborates with talented coworkers, including Yohei Sano and Shinichiro Kawakami. These collaborations have fostered an environment of creativity and innovation, pushing the boundaries of what is possible in their field of expertise.

Conclusion

Tomoya Onitsuka exemplifies the spirit of innovation through his patented inventions and collaborative efforts. His contributions to heat treatment technology not only enhance product quality but also pave the way for future advancements in the semiconductor industry. With continuous efforts and support from his colleagues, Onitsuka is poised to make even greater impacts in the realm of thermal processing technologies.

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