The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2020

Filed:

Nov. 28, 2017
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Yohei Sano, Koshi, JP;

Shinichiro Kawakami, Koshi, JP;

Masashi Enomoto, Koshi, JP;

Takahiro Shiozawa, Koshi, JP;

Keisuke Yoshida, Koshi, JP;

Tomoya Onitsuka, Koshi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/324 (2006.01); G03F 7/38 (2006.01); H01L 21/027 (2006.01); G03F 7/004 (2006.01); H01L 21/67 (2006.01); H01L 21/3105 (2006.01);
U.S. Cl.
CPC ...
G03F 7/38 (2013.01); G03F 7/0043 (2013.01); H01L 21/0273 (2013.01); H01L 21/0274 (2013.01); H01L 21/31058 (2013.01); H01L 21/67017 (2013.01); H01L 21/6719 (2013.01); H01L 21/67103 (2013.01);
Abstract

A thermal treatment apparatus performs a thermal treatment on a metal-containing film formed on a substrate. The thermal treatment apparatus includes a treatment chamber that houses the substrate; a thermal treatment plate that is provided inside the treatment chamber and mounts the substrate thereon; and a moisture supply unit that supplies moisture to the metal-containing film. At the time of the thermal treatment, moisture is supplied to the metal-containing film of the substrate on the thermal treatment plate and an atmosphere in the treatment chamber is exhausted from a central portion of the treatment chamber.


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