Tokyo, Japan

Tomohiro Shinagawa


Average Co-Inventor Count = 3.7

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Tokyo, JP (2020 - 2021)
  • Chiyoda-ku, JP (2021)

Company Filing History:


Years Active: 2020-2025

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5 patents (USPTO):Explore Patents

Title: Innovations of Tomohiro Shinagawa: Advancements in Semiconductor Manufacturing

Introduction

Tomohiro Shinagawa, an accomplished inventor based in Tokyo, Japan, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio that includes four patents, Shinagawa has focused on innovative methods and devices that enhance the efficiency and reliability of semiconductor manufacturing processes.

Latest Patents

Among his latest patents, two stand out for their groundbreaking approaches to semiconductor technology. The first patent details a **semiconductor manufacturing method and semiconductor manufacturing device**, which introduces a specialized device comprising a lower substrate support base for a diamond substrate and an upper substrate support base for a semiconductor substrate. This innovative device features a drive unit that allows both substrates to be brought into close contact while applying pressure, ensuring optimal alignment. Furthermore, it includes a mechanism to deform the upper substrate support base's surface, facilitating a parallel alignment with the diamond substrate.

The second patent pertains to a **semiconductor device and method for manufacturing a semiconductor device** that integrates a crystalline nitride layer and utilizes diamond for heat dissipation. This invention addresses the critical issue of cracking in the crystalline nitride layer, incorporating a layered body that includes both a non-inhibiting and inhibiting portion for diamond growth. The strategic arrangement of these components ensures effective heat dissipation while maintaining the integrity of the semiconductor device.

Career Highlights

Tomohiro Shinagawa's career is marked by his dedication to advancing semiconductor technologies. Working at Mitsubishi Electric Corporation, he has played a crucial role in driving innovations within the company. His efforts have consistently yielded results that push the boundaries of what is possible in semiconductor manufacturing, thereby enhancing the performance and reliability of electronic devices.

Collaborations

Throughout his career, Shinagawa has collaborated with esteemed colleagues, including Takeo Furuhata and Keisuke Nakamura. Their combined expertise and innovative thinking have contributed to the successful development of several patented technologies that address complex challenges within the semiconductor industry.

Conclusion

Tomohiro Shinagawa exemplifies the spirit of innovation within the semiconductor field. Through his inventive methodologies and collaborative efforts, he has significantly influenced the development of semiconductor manufacturing processes. As he continues to push the boundaries of technology at Mitsubishi Electric Corporation, his contributions are expected to pave the way for future advancements in this critical sector.

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