Company Filing History:
Years Active: 1999-2009
Title: Innovations of Inventor Ting Sing Wang
Introduction
Ting Sing Wang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on advanced gate structures that enhance the performance of semiconductor devices.
Latest Patents
One of his latest patents is titled "Multi-step gate structure and method for preparing the same." This invention features a multi-step gate structure that includes a semiconductor substrate with a multi-step design, a gate oxide layer, and a conductive layer. The gate oxide layer is uniquely designed with varying thicknesses across the step surfaces, which helps to address issues related to the short channel effect in semiconductor devices. Another significant patent is the "Recessed gate structure and method for preparing the same." This invention also utilizes a multi-step structure and includes a recess in the semiconductor substrate, allowing for a tailored gate oxide layer and improved control over the threshold voltage.
Career Highlights
Ting Sing Wang has worked with prominent companies in the semiconductor industry, including Promos Technologies, Inc. and Mosel Vitelic Corporation. His experience in these organizations has contributed to his expertise in developing innovative semiconductor technologies.
Collaborations
Throughout his career, Ting Sing Wang has collaborated with several talented individuals, including Der-Tsyr Fan and Chon-Shin Jou, who is a notable woman in the field.
Conclusion
Ting Sing Wang's contributions to semiconductor technology through his innovative patents and collaborations highlight his importance as an inventor in the industry. His work continues to influence advancements in semiconductor design and functionality.