Timothy McEntee

Title: The Innovative Contributions of Timothy McEntee

Introduction

Timothy McEntee is a notable inventor based in Deutschland, DE. He has made significant contributions to the field of semiconductor technology. His work focuses on the deposition of layers containing silicon and germanium, which are crucial for various electronic applications.

Latest Patents

Timothy McEntee holds a patent for a "Process for depositing layers containing silicon and germanium." This invention relates to a method for depositing at least one semiconductor layer on a substrate within a processing chamber. The semiconductor layer is composed of multiple components that are evaporated through a non-continuous injection of a liquid starting material into a tempered evaporation chamber. The method is characterized by the individual adjustment of mass flow rate parameters, such as preliminary injection pressure and injection frequency, which optimize the deposition process.

Career Highlights

Timothy McEntee is currently employed at Aixtron, Inc., where he continues to advance semiconductor technology. His innovative approach has positioned him as a key figure in the development of efficient deposition methods for semiconductor layers.

Collaborations

Timothy has collaborated with notable coworkers, including Marcus Schumacher and Peter Baumann. Their combined expertise contributes to the success of their projects and the advancement of semiconductor technologies.

Conclusion

Timothy McEntee's contributions to semiconductor technology through his innovative patent and work at Aixtron, Inc. highlight his importance in the field. His dedication to advancing deposition methods for silicon and germanium layers showcases the impact of his work on the industry.