Timothy J Wiltshire

Title: Innovations of Timothy J Wiltshire

Introduction

Timothy J Wiltshire is a notable inventor based in Fishkill, NY (US). He has made significant contributions to the field of technology, particularly in the area of semiconductor manufacturing. With a total of 6 patents to his name, Wiltshire has demonstrated a commitment to advancing innovative methods and processes.

Latest Patents

Among his latest patents is a method for forming edge etch protection using dual layers of positive-negative tone resists. This method involves providing a wafer substrate, depositing a first type resist on its surface, and creating a resist ring around the peripheral edge. The resist ring is then cured, followed by the deposition of a second type resist that differs from the first. Another notable patent is for providing rotationally symmetric alignment marks for an alignment system that requires an asymmetric geometric layout. This invention includes an integrated circuit device with alignment marks that feature coded regions, enhancing the precision of alignment in semiconductor applications.

Career Highlights

Timothy has worked with prominent companies in the tech industry, including International Business Machines Corporation (IBM) and Globalfoundries Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking projects in semiconductor technology.

Collaborations

Throughout his career, Wiltshire has collaborated with talented individuals such as Christopher P Ausschnitt and Santo Credendino. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Timothy J Wiltshire's contributions to the field of technology through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in semiconductor manufacturing and alignment systems.