The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 1999
Filed:
Nov. 14, 1997
Applicant:
Inventors:
Christopher P Ausschnitt, Brookfield, CT (US);
Timothy J Wiltshire, Fishkill, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01B / ; G03F / ;
U.S. Cl.
CPC ...
356401 ; 430 22 ; 430 30 ;
Abstract
A method for overlay metrology and control. Simultaneous use of between-field overlay metrology to control field term alignment error at all levels and level-to-level metrology to control field term, grid term, and translation alignment errors at all levels is applied.
Ausschnitt, Christopher. (1999). Method for overlay control system (U.S. Patent No. 5877861). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5877861
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile