The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2002
Filed:
Sep. 14, 1999
Steffen Schulze, Wappingers Falls, NY (US);
Kathryn H. Varian, Hopewell Junction, NY (US);
Timothy Wiltshire, Fishkill, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Various fill strategies in the optical kerf are provided. A semiconductor wafer is divided into chip areas by strips of optical kerf regions. The optical kerf regions contain alignment marks used in the lithography processes. Partial fill patterns are provided in the optical kerf regions so that the area factor of the kerf region is similar to that of the chip areas. This results in full planarization by chemical mechanical polishing becoming feasible. Additionally, the fill is patterned so the alignment marks may be read accurately.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile