Tien-min Yuan

Title: Tien-min Yuan: Innovator in Semiconductor Processing

Introduction

Tien-min Yuan is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor processing, particularly in etching technologies. With a total of 4 patents to his name, Yuan's work has enhanced the efficiency and effectiveness of various processes in the semiconductor industry.

Latest Patents

One of Yuan's latest patents is a method for removing polymer stacked on a lower electrode within an etching reaction chamber. The invention aims to provide preventive maintenance for effectively removing polymer buildup during the dry etching of a silicon oxide layer. The process involves setting the lower electrode at 0°C and pre-cleaning the reaction chamber multiple times. After pre-cleaning, nitrogen or inert gas is introduced to equalize the internal pressure to atmospheric levels. The chamber is then opened for 10 minutes while maintaining the lower electrode's temperature. The surface of the lower electrode is wiped with a clean cloth to remove the polymer, followed by a thorough cleaning with de-ionized water and other solvents. This method prevents scratches and damage to the lower electrode, thereby increasing its lifespan and enhancing the stability of the etching process.

Another significant patent involves a method for polysilicon etching using HBr, He, and He/O as reactive gas sources. This method maintains a chamber pressure greater than 30 mTorr to achieve high selectivity to polysilicon over silicon oxide. The total flow rate of HBr and He is set above 420 sccm, with specific flow rates for each gas to optimize the etching process.

Career Highlights

Yuan is currently employed at Mosel Vitelic Corporation, where he continues to innovate in semiconductor technologies. His work has been instrumental in advancing the capabilities of etching equipment, which is crucial for the production of semiconductor devices.

Collaborations

Yuan has collaborated with notable colleagues such as Shih-Chi Lai and Kuang-Yung Wu. Their combined expertise has contributed to the development of advanced technologies in the semiconductor field.

Conclusion

Tien-min Yuan's contributions to semiconductor processing through his innovative patents have significantly impacted the industry. His methods for improving etching processes demonstrate his commitment to enhancing technology in this critical field.