This inventor holds 8 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2002-2012.
Company Filing History:
Years Active: 2002-2012
Title: Innovations of Tian H Lim
Introduction
Tian H Lim is a prominent inventor based in Santa Clara, CA (US). He has made significant contributions to the field of materials science, particularly in the development of dielectric films. With a total of 8 patents to his name, Lim's work has had a substantial impact on the industry.
Latest Patents
One of his latest patents is titled "Post-deposition treatment to enhance properties of Si-O-C low K films." This method provides a dielectric film with enhanced adhesion and stability. The process involves a post-deposition treatment that densifies the film in a reducing atmosphere, improving stability when the film is cured ex-situ. The densification typically occurs in a reducing environment while heating the substrate. This treatment is especially suitable for silicon-oxygen-carbon low dielectric constant films deposited at low temperatures.
Career Highlights
Tian H Lim is currently employed at Applied Materials, Inc., where he continues to innovate and develop new technologies. His expertise in dielectric films has positioned him as a key player in the field.
Collaborations
Lim has collaborated with notable colleagues, including Li-Qun Xia and Frederic Gaillard, further enhancing the scope and impact of his work.
Conclusion
Tian H Lim's contributions to the field of materials science, particularly through his innovative patents, demonstrate his commitment to advancing technology. His work continues to influence the development of dielectric films, showcasing the importance of innovation in this sector.