Thomas Tillocher

Title: The Innovative Contributions of Thomas Tillocher

Introduction

Thomas Tillocher is a notable inventor based in Orleans, France. He has made significant contributions to the field of etching methods and apparatuses, holding a total of three patents. His work has advanced the technology used in various industrial applications, particularly in the semiconductor industry.

Latest Patents

Tillocher's latest patents include an etching method and etching apparatus. This method involves a physical adsorption process that adsorbs an adsorbate based on a first processing gas on a film to be etched. The process occurs under conditions where the pressure of the first processing gas is smaller than its saturated vapor pressure relative to the temperature of the object being processed. Additionally, he has developed a method for selective etching using fluorine, oxygen, and noble gas-containing plasmas. This method includes a cyclic plasma etch process that generates plasmas from specific gas mixtures to achieve effective substrate processing.

Career Highlights

Throughout his career, Thomas Tillocher has worked with prominent organizations such as Tokyo Electron Limited and Université d'Orléans. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking innovations in etching technology.

Collaborations

Tillocher has collaborated with esteemed colleagues, including Shigeru Tahara and Jacques Faguet. These partnerships have fostered a collaborative environment that has led to the development of advanced etching techniques.

Conclusion

Thomas Tillocher's innovative work in etching methods and apparatuses has made a significant impact on the industry. His patents reflect a deep understanding of the complexities involved in substrate processing, showcasing his expertise and dedication to advancing technology.