Ulm, Germany

Thomas Theiler


 

Average Co-Inventor Count = 4.3

ph-index = 2

Forward Citations = 37(Granted Patents)


Company Filing History:


Years Active: 1999-2014

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3 patents (USPTO):

Title: Thomas Theiler: Innovator in Microwave Plasma Technology

Introduction

Thomas Theiler is a notable inventor based in Ulm, Germany. He has made significant contributions to the field of microwave plasma technology, holding a total of 3 patents. His work focuses on devices and methods that enhance the production and treatment of semiconductor substrates.

Latest Patents

Among his latest patents, Theiler has developed a device and method for producing dielectric layers in microwave plasma. This innovative device is designed to produce a microwave plasma and includes a coaxial inner conductor made of electrically conductive material, surrounded by a coaxial outer conductor. The design allows for microwave radiation generated by the microwave generator to exit substantially perpendicular to the longitudinal axis of the coaxial inner conductor. Another significant patent involves a method for the thermal treatment of disk-shaped substrates, which aims to reduce flash in an injection mold. This apparatus utilizes an active material actuator that changes dimension in response to electrical signals, effectively urging the first mold surface relative to the second to minimize flash.

Career Highlights

Throughout his career, Thomas Theiler has worked with several prominent companies, including Steag Ast and Mattson Technology, Inc. His experience in these organizations has contributed to his expertise in microwave plasma technology and semiconductor processing.

Collaborations

Theiler has collaborated with notable professionals in his field, including Werner Blersch and Peter Gruenwald. These partnerships have further enriched his work and innovations.

Conclusion

Thomas Theiler is a distinguished inventor whose contributions to microwave plasma technology have advanced the field significantly. His innovative patents and collaborations reflect his commitment to enhancing semiconductor processing techniques.

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