Mattson Technology, Inc

Steag Ast

Hq-dielectrics Gmbh

Thomas Theiler

Zsolt Nenyei

Wilfried Lerch

Heinrich Walk

Patrick Schmid

Werner Blersch

Michael Maurer

Thorsten Hülsmann

Helmut Merkle

Steffen Frigge

Peter Gruenwald

Zsolt Nenyel

Alexander Gschwandter

A device for producing a microwave plasma, and a device and a method for treating semiconductor substrates with a microwave plasma, the microwave plasma device comprising at least one electrode (), an electrode () comprising a coaxial inner conductor () made of electrically conductive material and a coaxial outer conductor () made of electrically conductive material and surrounding the inner conductor at least partially and being disposed at a distance thereto, and a plasma ignition device () that is connected to the coaxial inner conductor (), characterized in that the coaxial outer conductor () comprises at least one first partial region () in which it completely surrounds the coaxial inner conductor () along the longitudinal axis thereof and comprises at least one further partial region () in which it surrounds the coaxial inner conductor () partially such that microwave radiation generated by the microwave generator () can exit in the at least one further partial region () substantially perpendicular to the longitudinal axis of the coaxial inner conductor ().

Device and method for producing dielectric layers in microwave plasma

Disclosed is an apparatus and a method for reducing flash in an injection mold (or) which molds a molded article between a first mold surface and a second mold surface. The apparatus includes an active material actuator (orandorand) configured to, in response to application or removal of an electrical actuation signal thereto, change dimension and urge the first mold surface relative to the second mold surface to reduce flash therebetween. The apparatus also includes a transmission structure () configured to provide in use, the electrical actuation signal to said active material actuator (orandorand) includes a set of active material actuators stacked one against the other to provide a varying sealing force to urge the first mold surface relative to the second mold surface.

Method for the thermal treatment of disk-shaped substrates

A rapid thermal processing (RTP) chamber, wherein one wall of the chamber supporting a substrate rotates with respect to the rest of the chamber so that the substrate being treated in the RTP chamber is relatively rotated with respect to the lamps heating the substrate.

Rapid thermal processing (RTP) system with rotating substrate

Growing community of inventors

Ulm, Germany

Thomas Theiler