Location History:
- Burlington, VT (US) (1995)
- St. Mesa, AZ (US) (2000)
- Monroe, NY (US) (1998 - 2001)
- Mesa, AZ (US) (2000 - 2004)
Company Filing History:
10 out of 10,346 
1 out of 832,912 Years Active: 1995-2004
Title: Thomas J Licata: Innovator in Semiconductor Manufacturing
Introduction
Thomas J Licata, based in Mesa, AZ, is a prominent inventor known for his significant contributions to semiconductor manufacturing. With a portfolio of 10 patents, he has played a pivotal role in advancing technologies essential for efficient metal interconnects in microelectronic devices.
Latest Patents
Licata's latest patents include groundbreaking methods in the field of copper film deposition. One of these patents is for the "Redistribution of Copper Deposited Films," which describes a method to redistribute solid copper deposited by physical vapor deposition (PVD) on varying wafer topographies. The innovative approach solubilizes deposited copper in a fluid for redistribution, thereby addressing the common issue of nonuniformity in copper film thickness. This method enhances adhesion, grain growth, and orientation while achieving excellent step coverage, similar to that produced by chemical vapor deposition (CVD).
Another notable patent is on "Optimized Liners for Dual Damascene Metal Wiring." This invention focuses on forming diffusion barrier stacks on dielectric materials for dual damascene metal chip-level interconnects. By depositing alternating layers of metals and electrically resistive diffusion barriers, such as tantalum and tantalum nitride, Licata's method ensures optimized thicknesses tailored for specific functions within the device.
Career Highlights
Thomas J Licata is currently associated with Tokyo Electron Limited, a leader in the semiconductor manufacturing industry. His work there involves intricate research and development aimed at improving manufacturing processes and materials for semiconductor devices.
Collaborations
Throughout his career, Licata has collaborated with notable coworkers, including John Stephen Drewery and Joseph T Hillman. These partnerships have further enriched his research endeavors and contributed to innovative outcomes in semiconductor technologies.
Conclusion
With a strong background in developing advanced materials and methods for semiconductor manufacturing, Thomas J Licata continues to shape the future of the industry. His patents not only reflect his expertise but also demonstrate a commitment to overcoming challenges in the field, cementing his status as a leading inventor in technology.