The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 1995
Filed:
Mar. 24, 1993
Applicant:
Inventors:
Pei-Ing P Lee, Williston, VT (US);
Thomas J Licata, Burlington, VT (US);
Thomas L McDevitt, Underhill, VT (US);
Paul C Parries, Wappingers Falls, NY (US);
Scott L Pennington, South Burlington, VT (US);
James G Ryan, Essex Junction, VT (US);
David C Strippe, Waterbury Center, VT (US);
Assignee:
Other;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437192 ; 437195 ; 437203 ;
Abstract
A process for sputter deposition wherein high aspect ratio apertures are coated with conductive films exhibiting low bulk resistivity, low impurity concentrations, and regular morphologies. A collimator is used having an aspect ratio that approximates the aspect ratio of the apertures.