Aalen, Germany

Thomas Fischer


 

Average Co-Inventor Count = 2.2

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2016-2023

Loading Chart...
Loading Chart...
6 patents (USPTO):Explore Patents

Title: Thomas Fischer: Innovator in Optical Systems

Introduction

Thomas Fischer is a prominent inventor based in Aalen, Germany. He has made significant contributions to the field of optical systems, particularly in the area of projection exposure systems for EUV lithography. With a total of six patents to his name, Fischer's work has advanced the technology used in high-precision imaging applications.

Latest Patents

Fischer's latest patents include a measurement illumination optical unit designed for guiding illumination light into the object field of a projection exposure system for EUV lithography. This innovative optical unit features a field facet mirror with multiple field facets and a pupil facet mirror with several pupil facets. These components work together to achieve overlaid imaging in the object field, enhancing the precision of lithographic processes. Another notable patent involves an optical system that includes an illumination optical unit configured to guide illumination radiation along a specific path to an object plane. This system comprises a first facet mirror, a second facet mirror, and a condenser mirror, all of which play crucial roles in imaging articles with high accuracy.

Career Highlights

Fischer is currently employed at Carl Zeiss SMT GmbH, a leading company in the field of optical systems and lithography technology. His work at Zeiss has positioned him as a key player in the development of advanced optical solutions for various applications.

Collaborations

Throughout his career, Fischer has collaborated with notable colleagues such as Stig Bieling and Martin Endres. These partnerships have fostered innovation and contributed to the success of various projects within the optical systems domain.

Conclusion

Thomas Fischer's contributions to optical systems and his innovative patents have significantly impacted the field of EUV lithography. His work continues to influence advancements in high-precision imaging technologies.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…