The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2019
Filed:
Nov. 16, 2017
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An illumination optical unit for EUV projection lithography illuminates an object field with illumination light. The illumination optical unit has a first facet mirror including a plurality of first facets on a first mirror carrier. Disposed downstream of the first facet mirror is a second facet mirror including a plurality of second facets arranged on a second mirror carrier around a facet arrangement center. Partial beams of the illumination light are guided superposed on one another into the object field, respectively via illumination channels which have one of the first facets and one of the second facets. Second maximum angle facets are arranged at the edge of the second mirror carrier. The second maximum angle facets predetermine maximum illumination angles of the illumination light which deviate maximally from a chief ray incidence on the object field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile