Tetsuya Ohishi

Title: Tetsuya Ohishi: Innovator in Plasma Processing Technology

Introduction

Tetsuya Ohishi is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing, holding a total of 4 patents. His work focuses on innovative methods and apparatuses that enhance substrate processing techniques.

Latest Patents

Ohishi's latest patents include a plasma processing method and a plasma processing apparatus. The plasma processing method involves a substrate processing step that performs predetermined processing on a target substrate using plasma from a hydrogen-containing gas. This is followed by an in-chamber processing step that treats the surfaces of components in the chamber with plasma from an oxygen-containing gas. The substrate processing step is repeated after the in-chamber processing step. Another notable patent is a method for cleaning a substrate processing apparatus that etches a film containing metal. This method includes providing an inert gas to remove metal-containing deposition and subsequently using a gas containing fluorine and oxygen to eliminate silicon-containing deposition.

Career Highlights

Tetsuya Ohishi is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His expertise in plasma processing has positioned him as a key figure in advancing technologies that are critical for modern electronics.

Collaborations

Ohishi has collaborated with notable colleagues, including Takuya Kubo and Song Yun Kang. These partnerships have fostered innovation and development in their respective fields.

Conclusion

Tetsuya Ohishi's contributions to plasma processing technology exemplify his commitment to innovation. His patents reflect a deep understanding of the complexities involved in substrate processing, making him a valuable asset in the industry.