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For the Inventor, By the Inventor

Odawara, Japan

Tetsuo Asaba

This inventor holds 16 USPTO granted patents. Top assignees: Canon Kabushiki Kaisha, Conon Kabushiki Kaisha. Active years: 1994-2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tetsuo Asaba. Retrieved from https://idiyas.com/inventor/tetsuo-asaba

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 16

% Patents Active = 100.0

Average Co-Inventor Count = 3.1

ph-index = 7

Forward Citations = 177(Granted Patents)


Location History:

  • Atsugi, JP (1994 - 1997)
  • Odawara, JP (1995 - 2000)

Company Filing History:

goldMedal15 out of 93,085 
 
Canon Kabushiki Kaisha
 patents
silverMedal1 out of 1 
 
Conon Kabushiki Kaisha
 patent

Years Active: 1994-2000

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16 patents (USPTO):Explore Patents
1. 6156657 - Method of treating active material (2000-12-05),
2. 6128052 - Semiconductor device applicable for liquid crystal display device, and (2000-10-03),
3. 5975685 - Ink jet recording head having an oriented p-n junction diode, and (1999-11-02),
4. 5963812 - Manufacturing method of a semiconductor apparatus having an electron (1999-10-05),
5. 5850242 - Recording head and recording apparatus and method of manufacturing same (1998-12-15),
6. 5776255 - Chemical vapor deposition apparatus (1998-07-07),
7. 5614439 - Method of making a planar wiring in an insulated groove using (1997-03-25),
8. 5580808 - Method of manufacturing a ROM device having contact holes treated with (1996-12-03),
9. 5569614 - Method of forming metal pattern including a schottky diode (1996-10-29),
10. 5547708 - Chemical vapor deposition method for forming a deposited film with the (1996-08-20),
11. 5534453 - Method of manufacturing titanium silicide containing semiconductors (1996-07-09),
12. 5534069 - Method of treating active material (1996-07-09),
13. 5527730 - Method of forming a capacitor having contact hole treated with hydrogen (1996-06-18),
14. 5383970 - Chemical vapor deposition method for forming a deposited film with the (1995-01-24),
15. 5364802 - Method of making a semiconductor device with buried electrode (1994-11-15),

Title: The Innovative Contributions of Tetsuo Asaba: A Unifying Force in Semiconductor Technology

Introduction: Tetsuo Asaba, hailing from Odawara, Japan, is a remarkable inventor known for his significant contributions to semiconductor technology. With an impressive portfolio of 16 patents, his work is characterized by innovative methods that enhance the efficiency and functionality of thin film forming apparatuses and semiconductor devices.

Latest Patents: Among his latest inventions, Asaba developed a method of treating active materials, which involves the interaction of an active substance with an inactivating substance within an exhaust system specifically tailored for thin film forming apparatuses. This invention features a common chamber that supports both plasma and thermal chemical vapor deposition, thereby optimizing the environment for substrate processing. Additionally, he created a semiconductor device designed for liquid crystal display applications. This device integrates a semiconductor monocrystalline substrate with a light-transmitting film and combines both non-monocrystalline and monocrystalline semiconductor elements to facilitate electrical connectivity.

Career Highlights: Tetsuo Asaba's career has seen him associated with notable companies, including Canon Kabushiki Kaisha. His tenure in these organizations has been marked by a dedication to advancing semiconductor technology through research and development. His innovations have consistently pushed the boundaries of what is possible in the realm of electronic devices.

Collaborations: Throughout his career, Asaba has collaborated with esteemed colleagues such as Kenji Makino and Hideshi Kuwabara. These partnerships have not only enriched his research but have also fostered the exchange of ideas crucial to the field of semiconductor innovation.

Conclusion: Tetsuo Asaba's contributions to the field of semiconductor technology and his extensive patent portfolio underscore his role as a pivotal inventor in the industry. His work not only enhances the performance of existing technologies but also paves the way for future innovations, making him a key figure in the ever-evolving landscape of electronic device development.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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