This inventor holds 3 USPTO granted patents. Top assignees: Varian Associates, Inc., Varian Semiconductor Equipment Associates, Inc.. Active years: 1994-2003.
Company Filing History:
2 out of 777 
1 out of 916 
Years Active: 1994-2003
Title: The Innovations of Terry T Sheng
Introduction
Terry T Sheng is a notable inventor based in San Jose, CA, who has made significant contributions to the field of semiconductor technology. With a total of 3 patents to his name, Sheng has developed innovative processes that enhance the efficiency and effectiveness of ion implantation techniques.
Latest Patents
One of Sheng's latest patents is the "Plasma immersion ion implantation process." This invention focuses on an implantation process for cold cathode plasma immersion ion implantation (C PI) without a continuous plasma. It utilizes very short high voltage, low duty cycle ionization pulses, in conjunction with a synchronously produced electron flow to neutralize positively charged wafer surfaces. Another significant patent is the "Charge monitor for high potential pulse current dose measurement." This system is designed for determining implantation dose in a PI³ system, featuring means to compensate for current in the charge sensor that does not arise from positive ions arriving on the wafer.
Career Highlights
Throughout his career, Terry T Sheng has worked with prominent companies such as Varian Associates, Inc. and Varian Semiconductor Equipment Associates, Inc. His work in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.
Collaborations
Some of Sheng's notable coworkers include Charles B Cooper, III and Charles E Van Wagoner. Their collaboration has contributed to the advancement of technology in their respective fields.
Conclusion
Terry T Sheng's contributions to the field of semiconductor technology through his patents and career highlights demonstrate his innovative spirit and dedication to advancing the industry. His work continues to influence the development of ion implantation processes, showcasing the importance of innovation in technology.