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For the Inventor, By the Inventor

Boise, ID, United States of America

Ted Lyle Taylor

This inventor holds 18 USPTO granted patents and 1 published patent application, primarily in Semiconductor Technology. Top assignees: Micron Technology Incorporated, Other. Active years: 1989-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ted Lyle Taylor. Retrieved from https://idiyas.com/inventor/ted-lyle-taylor

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 18 

% Patents Active = 88.9

Average Co-Inventor Count = 2.0

ph-index = 10

Forward Citations = 296(Granted Patents)


Location History:

  • Mt. Holly, VT (US) (1989)
  • Helena, MT (US) (2000 - 2001)
  • Boise, ID (US) (2001 - 2024)

Company Filing History:

goldMedal17 out of 39,383 
 
Micron Technology Incorporated
 patents
silverMedal1 out of 834,708 
Other
 patents

Years Active: 1989-2025

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Areas of Expertise:
Semiconductor Devices
High Aspect Ratio
Etching Chemistries
Parameter Measurement
Transistors
Multi-layer Structures
Defect Detection
Copper Deposition
Electronic Devices
Assemblies
Structures
18 patents (USPTO):Explore Patents
1. 12462370 - System for predicting properties of structures, imager system, and related methods (2025-11-04),
2. 11869178 - System for predicting properties of structures, imager system, and related methods (2024-01-09),
3. 10872403 - System for predicting properties of structures, imager system, and related methods (2020-12-22),
4. 8791506 - Semiconductor devices, assemblies and constructions (2014-07-29),
5. 8614151 - Method of etching a high aspect ratio contact (2013-12-24),
6. 8088691 - Selective etch chemistries for forming high aspect ratio features and associated structures (2012-01-03),
7. 8044479 - Transistors, semiconductor devices, assemblies and constructions (2011-10-25),
8. 7883907 - Parameter measurement using multi-layer structures (2011-02-08),
9. 7642550 - Multi-layer structures for parameter measurement (2010-01-05),
10. 7537994 - Methods of forming semiconductor devices, assemblies and constructions (2009-05-26),
11. 7517804 - Selective etch chemistries for forming high aspect ratio features and associated structures (2009-04-14),
12. 6452677 - Method and apparatus for detecting defects in the manufacture of an electronic device (2002-09-17),
13. 6326303 - Copper electroless deposition on a titanium-containing surface (2001-12-04),
14. 6175417 - Method and apparatus for detecting defects in the manufacture of an electronic device (2001-01-16),
15. 6126989 - Copper electroless deposition on a titanium-containing surface (2000-10-03),

Title: Ted Lyle Taylor: A Trailblazer in Technological Innovation

Introduction: Ted Lyle Taylor, a visionary inventor based in Boise, ID, has made significant contributions to the world of technology with his inventive spirit and commitment to progress.

Latest Patents: With an impressive portfolio of 16 patents, Ted's recent innovations include a "System for predicting properties of structures, imager system, and related methods." This cutting-edge method involves leveraging machine learning techniques to predict virtual metrology data for wafer lots, revolutionizing the semiconductor industry.

Career Highlights: Ted Lyle Taylor has left a lasting impact through his work at companies like Micron Technology Incorporated and Micron Technologies, Inc. His expertise and creativity have been instrumental in driving advancements in technology and shaping the future of the industry.

Collaborations: Throughout his career, Ted has collaborated with talented individuals such as Karl M Robinson and Mark W Kiehlbauch. Together, they have shared knowledge, ideas, and innovations, leading to groundbreaking developments in the field of technology.

Conclusion: Ted Lyle Taylor stands out as a beacon of innovation, with his relentless pursuit of excellence and groundbreaking inventions cementing his legacy in the world of technology. His passion for progress and dedication to pushing the boundaries of what is possible continue to inspire future generations of inventors and innovators.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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