Te-Liang Lee

Title: Te-Liang Lee: Innovator in Semiconductor Technology

Introduction

Te-Liang Lee is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in memory devices and methods for preventing galvanic corrosion in semiconductor structures. With a total of 3 patents to his name, Lee continues to push the boundaries of innovation in his field.

Latest Patents

One of Te-Liang Lee's latest patents is titled "Two-transistor non-volatile memory cell and related program and read methods." This invention describes a memory device that includes both an N-channel transistor and a P-channel transistor. The design features a word line that is electrically connected to the drain terminal of the N-channel transistor and the source terminal of the P-channel transistor. Additionally, the first bit line connects to the source terminal of the N-channel transistor, while the second bit line connects to the drain terminal of the P-channel transistor. Notably, the gate terminals of both transistors are electrically connected and floating.

Another significant patent by Lee is the "Method of determining galvanic corrosion and interconnect structure in a semiconductor device for prevention of galvanic corrosion." This method involves receiving a design layout for a semiconductor device that includes an interconnect structure. It identifies a metal line in the layout that has at least one via and does not couple downward with an oxide diffusion region. The method assesses the area of a gate oxide coupled with the metal line and determines whether it exceeds a predetermined value, ensuring effective prevention of galvanic corrosion.

Career Highlights

Te-Liang Lee is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing memory technology and enhancing the reliability of semiconductor devices.

Collaborations

Throughout his career, Lee has collaborated with notable colleagues, including Chin-Yuan Ko and Ming-Yih Wang. These partnerships have fostered innovation and contributed to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Te-Liang Lee's contributions to semiconductor technology through his innovative patents and collaborations highlight his role as a key figure in the industry. His work continues to influence advancements in memory devices and corrosion prevention methods, showcasing the importance of innovation in technology.