Te-Jen Pan

Title: Te-Jen Pan: Innovator in Semiconductor Technology

Introduction

Te-Jen Pan is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of three patents. His work focuses on enhancing integrated circuit devices, which are crucial for modern electronics.

Latest Patents

One of Te-Jen Pan's latest patents involves a semiconductor device that includes an epitaxy region. This integrated circuit device features a gate stack positioned over a substrate, with L-shaped spacers made of silicon and carbon along its sidewalls. The design incorporates first and second source/drain epitaxy regions situated over the substrate, with an interlevel dielectric layer positioned strategically between these regions and the spacers. Another patent describes an exemplary method for forming a dummy gate structure over a substrate, which includes creating a set of spacers and forming source/drain epitaxy regions adjacent to these spacers. This innovative approach allows for the replacement of the dummy gate structure with a functional gate structure, enhancing the overall efficiency of semiconductor devices.

Career Highlights

Te-Jen Pan is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative designs have contributed to the advancement of semiconductor technology, making him a valuable asset to his company.

Collaborations

Te-Jen Pan collaborates with talented coworkers, including Yu-Hsien Lin and Hsiang-Ku Shen. Their combined efforts in research and development have led to significant advancements in semiconductor technology.

Conclusion

Te-Jen Pan's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His innovative approaches continue to shape the future of integrated circuit devices.