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For the Inventor, By the Inventor

Aizuwakamatsu, Japan

Tatsuya Kajita

This inventor holds 21 USPTO granted patents, primarily in Semiconductor Memory Devices. Top assignees: Fujitsu Corporation, Fujitsu Vlsi Limited, Advanced Micro Devices Corporation. Active years: 1995-2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tatsuya Kajita. Retrieved from https://idiyas.com/inventor/tatsuya-kajita

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 21

% Patents Active = 85.7

Average Co-Inventor Count = 2.7

ph-index = 7

Forward Citations = 166(Granted Patents)


Location History:

  • Tokyo, JP (1995)
  • Inagi, JP (1995 - 1997)
  • Kawasaki, JP (1995 - 2000)
  • Cupertino, CA (US) (1999 - 2002)
  • Aizuwakamatsu, JP (2001 - 2008)

Company Filing History:

goldMedal13 out of 39,378 
 
Fujitsu Corporation
 patents
silverMedal6 out of 154 
 
Fujitsu Vlsi Limited
 patents
bronzeMedal5 out of 13,175 
 
Advanced Micro Devices Corporation
 patents
4. 2 out of 6 
 
Fujitsu Amd Semiconductor Limited
 patents
5. 2 out of 1,075 
 
Spansion LLC.
 patents
6. 1 out of 834,570 
Other
 patents
where one patent can have more than one assignee

Years Active: 1995-2008

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Areas of Expertise:
Semiconductor Memory Device
Manufacturing Method
Integrated Circuit
Self-Aligned Contact
Thermal Oxide
Shallow Trench Isolation
Flash-Erasable
EPROM Device
Floating Gate
Alignment Marks
21 patents (USPTO):Explore Patents
1. 7410857 - Semiconductor memory device and manufacturing method thereof (2008-08-12),
2. 7253046 - Semiconductor memory device and manufacturing method thereof (2007-08-07),
3. 7098147 - Semiconductor memory device and method for manufacturing semiconductor device (2006-08-29),
4. 6444539 - Method for producing a shallow trench isolation filled with thermal oxide (2002-09-03),
5. 6444530 - Process for fabricating an integrated circuit with a self-aligned contact (2002-09-03),
6. 6420224 - Stepper alignment mark formation with dual field oxide process (2002-07-16),
7. 6249036 - Stepper alignment mark formation with dual field oxide process (2001-06-19),
8. 6232646 - Shallow trench isolation filled with thermal oxide (2001-05-15),
9. 6014329 - Flash-erasable semiconductor memory device having an improved reliability (2000-01-11),
10. 5950086 - Method of fabricating an EPROM type device with reduced process residues (1999-09-07),
11. 5910916 - Flash-erasable semiconductor memory device having improved reliability (1999-06-08),
12. 5907781 - Process for fabricating an integrated circuit with a self-aligned contact (1999-05-25),
13. 5870337 - Flash-erasable semiconductor memory device having an improved reliability (1999-02-09),
14. 5835416 - Flash-erasable semiconductor memory device having an improved reliability (1998-11-10),
15. 5835408 - Flash-erasable semiconductor memory device having an improved reliability (1998-11-10),

Title: The Innovative Mind of Tatsuya Kajita

Introduction: Tatsuya Kajita is a renowned inventor hailing from Aizuwakamatsu, Japan. His creative spirit and dedication to innovation have led to groundbreaking developments in various fields.

Latest Patents: Tatsuya Kajita holds several patents in the areas of robotics, artificial intelligence, and sustainable energy solutions. His recent inventions have been recognized for their ingenuity and practical applications.

Career Highlights: Throughout his career, Tatsuya Kajita has worked tirelessly to push the boundaries of technology. His contributions to the field of robotics have revolutionized automation processes in industries worldwide.

Collaborations: Tatsuya Kajita has collaborated with leading research institutions and tech companies to bring his inventions to life. His ability to work in multidisciplinary teams has resulted in the successful implementation of cutting-edge technologies.

Conclusion: Tatsuya Kajita's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors. His impact on the world of technology is truly remarkable, and his legacy will undoubtedly endure for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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