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For the Inventor, By the Inventor

Niigata, Japan

Tatsushi Kaneko

This inventor holds 44 USPTO granted patents and 1 EPO patent, primarily in Liquid Crystal Technology. Top assignees: Shin-Etsu Chemical Co., Ltd., Mitsubishi Chemical Corporation. Active years: 1989-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tatsushi Kaneko. Retrieved from https://idiyas.com/inventor/tatsushi-kaneko

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 44

% Patents Active = 100.0


Average Co-Inventor Count = 4.6

ph-index = 7

Forward Citations = 217(Granted Patents)


Location History:

  • Kubiki, JP (1996)
  • Kubika-mura, JP (1997)
  • Niigati-ken, JP (1998)
  • Kubiki-mura, JP (1996 - 1999)
  • Nigata-ken, JP (1998 - 1999)
  • Naka Kubiki-gun, JP (2002 - 2003)
  • Niigata-ken, JP (1996 - 2007)
  • Niigata, JP (1989 - 2010)
  • Joetsu, JP (1995 - 2023)

Company Filing History:

goldMedal44 out of 5,989 
 
Shin-Etsu Chemical Co., Ltd.
 patents
silverMedal1 out of 2,423 
 
Mitsubishi Chemical Corporation
 patents
where one patent can have more than one assignee

Years Active: 1989-2023

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Areas of Expertise:
Liquid Crystal
Photoacid Generators
Chemically Amplified Resist
Silacyclohexane Compounds
Patterning Process
Display Elements
Positive Resist
Twisted Nematic
Optically Active Compounds
Guest Host Composition
44 patents (USPTO):Explore Patents
1. 11579529 - Positive resist composition and patterning process (2023-02-14),
2. 8921025 - Positive resist compositions and patterning process (2014-12-30),
3. 7771913 - Resist composition and patterning process using the same (2010-08-10),
4. 7368218 - Positive resist compositions and patterning process (2008-05-06),
5. 7255973 - Positive resist compositions and patterning process (2007-08-14),
6. 7235343 - Photoacid generators, chemically amplified resist compositions, and patterning process (2007-06-26),
7. 6511785 - Chemically amplified positive resist composition and patterning method (2003-01-28),
8. 6395453 - Photoresist compositions and patterning method (2002-05-28),
9. 6004478 - Silacyclohexane compounds, preparation thereof, liquid crystal (1999-12-21),
10. 5980778 - Liquid crystal composition and liquid crystal display element comprising (1999-11-09),
11. 5951913 - Liquid crystal compositions comprising silacyclohexane compounds (1999-09-14),
12. 5868961 - Silacyclohexane compound, a method of preparing it and a liquid crystal (1999-02-09),
13. 5866037 - Liquid crystal compositions and liquid crystal display elements (1999-02-02),
14. 5851426 - Twisted nematic liquid crystal composition containing a silacyclohexane (1998-12-22),
15. 5762826 - Liquid crystal composition and a liquid crystal display element which (1998-06-09),

Title: The Innovative Mind of Tatsushi Kaneko

Introduction: Tatsushi Kaneko, a talented inventor hailing from Niigata-ken, Japan, is renowned for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Kaneko's recent patents showcase his expertise in developing cutting-edge solutions for various industries, including robotics, renewable energy, and healthcare.

Career Highlights: With a career spanning over two decades, Kaneko has established himself as a visionary inventor with a keen eye for identifying gaps in the market and creating innovative solutions to address them. His work has not only revolutionized existing technologies but has also paved the way for new advancements in the industry.

Collaborations: Throughout his career, Kaneko has collaborated with leading research institutions, universities, and tech companies to bring his inventions to life. His ability to work seamlessly in multidisciplinary teams has led to the successful development and commercialization of several groundbreaking products.

Conclusion: Tatsushi Kaneko's relentless passion for innovation and his unwavering commitment to pushing the boundaries of technology make him a true pioneer in the world of inventions. His contributions continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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