The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2003
Filed:
Nov. 13, 2000
Applicant:
Inventors:
Katsuya Takemura, Nakakubiki-gun, JP;
Kenji Koizumi, Nakakubiki-gun, JP;
Tatsushi Kaneko, Nakakubiki-gun, JP;
Toyohisa Sakurada, Nakakubiki-gun, JP;
Assignee:
Shin Etsu Chemical Co., Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C 1/73 ; G03F 7/039 ; G03F 7/30 ; G03F 7/38 ; G03F 7/40 ;
U.S. Cl.
CPC ...
G03C 1/73 ; G03F 7/039 ; G03F 7/30 ; G03F 7/38 ; G03F 7/40 ;
Abstract
A chemically amplified positive resist composition comprising a base resin and a compound containing two to six functional groups, specifically alkenyloxy, acetal and ortho-ester groups in the molecule is suitable for forming a contact hole pattern by the thermal flow process.